Three-dimensional electron number densities in a titanium PLD plasma using interferometry

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 128-129

  Doyle, L A ^a   Martin, G W ^a   Williamson, T P ^a   Al Khateeb, A ^a   Weaver, I ^a   Riley, D ^a   Lamb, M ^a   Morrow, T ^a   Lewis, C L S ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; DENSITY MEASUREMENT (OPTICAL); DEPOSITION; ELECTRONS; INTERFEROMETRY; LASER PRODUCED PLASMAS; PULSED LASER APPLICATIONS; TITANIUM;

ELECTRON NUMBER DENSITY; PULSED LASER DEPOSITION PLASMA;

CARRIER CONCENTRATION;

EID: 0032632506     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763085     Document Type: Article

References (4)

1. D. B. Chrisey and G. K. Hubler, Eds., Pulsed Laser Deposition of Thin Films. New York: Wiley, 1994.
2. L. A. Doyle, G. W. Martin, A. Al-Khateeb, I. Weaver, D. Riley, M. J. Lamb, T. Morrow, and C. L. S. Lewis, "Electron number density measurements in magnesium laser produced plumes," Appl. Surf. Sci., vol. 127-129, no. 1-4, pp. 716-720, 1998.
3. D. A. Pepler, C. N. Danson, R. Bann, I. N. Ross, R. M. Stevenson, M. J. Norman, M. Desselberger, and O. Willi, "Focal spot smoothing and tailoring for high-power laser applications," SPIE Proc., vol. 1870, pp. 76-87, 1993.
4. Y. Kato, K. Mima, N. Miyanaga, S. Arinaga, Y. Kitagawa, M. Nakatsuka, and C. Yamanaka, "Random phasing of high-power lasers for uniform target acceleration and plasma-instability suppression," Phys. Rev. Lett., vol. 53, no. 11, pp. 1057-1060, 1984.