Acid diffusion and evaporation in chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 536-543

  Kim, Jin Baek ^a   Kwon, Young Gil ^a   Choi, Jae Hak ^a   Jung, Min Ho ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; COPOLYMERS; DIFFUSION IN SOLIDS; EVAPORATION; MOLECULAR WEIGHT; MONOMERS; PLASTIC FILMS; SYNTHESIS (CHEMICAL);

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0032632482     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350236     Document Type: Conference Paper

References (15)