Enhanced crystallinity of microcrystalline silicon thin films using deuterium in reactive magnetron sputter deposition at 230 °C

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 429-434

  Gerbi, J E ^a   Voyles, P ^a   Gibson, J M ^a   Abelson, J R ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; BAND STRUCTURE; CRYSTAL MICROSTRUCTURE; DEUTERIUM; ELLIPSOMETRY; HYDROGENATION; MAGNETRON SPUTTERING; PRESSURE EFFECTS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; THIN FILMS;

POST DEPOSITION THERMAL HYDROGEN EVOLUTION;

SEMICONDUCTING FILMS;

EID: 0032630214     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)