Structural, morphological, and mechanical properties of amorphous carbon and carbon nitride thin films deposited by reactive and ion beam assisted laser ablation

Journal of Materials Science

Volumn 34, Issue 5, 1999, Pages 1093-1098

  Bae, Jang Hwan ^a   Cho, Jaekyong ^a  

^a Gyeongsang National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; ELLIPSOMETRY; ION BEAMS; LASER ABLATION; MECHANICAL PROPERTIES; MOLECULAR STRUCTURE; MORPHOLOGY; NEODYMIUM LASERS; ORGANIC COMPOUNDS; RAMAN SPECTROSCOPY; SILICON WAFERS;

AMORPHOUS CARBON NITRIDE THIN FILMS; NITROGEN ION BEAM;

THIN FILMS;

EID: 0032629158     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004560415272     Document Type: Article

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