Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 400-409

  Fiedorowicz, Henryk ^a   Daido, Hiroyuki ^a   Bartnik, Andrzej ^a   Sakaya, Noriyuki ^a   Suzuki, Masayuki ^a   Kmetik, Viliam ^a   Szczure, Miroslaw ^a   Wilhein, Thomas ^a  

^a MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; IMAGING TECHNIQUES; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PULSED LASER APPLICATIONS; SPECTROGRAPHS;

EXTREME-ULTRAVIOLET LITHOGRAPHY (EUVL); GAS PUFF TARGETS;

X RAY LITHOGRAPHY;

EID: 0032628383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351112     Document Type: Conference Paper

References (15)