Hot electron emission lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 316-323

  Poppeller, M ^a   Cartier, E ^a   Tromp, R M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ELECTRON EMISSION; ELECTRON TUNNELING; IMAGE QUALITY; IMAGING TECHNIQUES; MASKS; SILICON WAFERS;

HOT ELECTRON EMISSION LITHOGRAPHY;

PHOTORESISTS;

EID: 0032628382     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351103     Document Type: Conference Paper

References (20)