Design of 200 nm, 170 nm, 140 nm DUV contact sweeper high transmission attenuating phase shift mask: Experimental results. Part 2

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 38-54

  Socha, Robert J ^a   Shi, Xuelong ^a   Holman, Ken ^a   Dusa, Mircea ^a   Conley, Will ^a   Petersen, John S ^a   Chen, Fung ^a   Laidig, Tom ^a   Wampler, Kurt ^a   Caldwell, Roger ^a   Chu, M C ^a   Su, C ^a   Huang, K ^a   Chen, C ^a   Wang, F ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EXCIMER LASERS; MASKS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0032627904     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)