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Volumn 36, Issue 7, 1999, Pages 41-45
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New role for e-beam: electron projection
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Author keywords
[No Author keywords available]
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Indexed keywords
COST EFFECTIVENESS;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON SCATTERING;
IMAGE PROCESSING;
IMAGING TECHNIQUES;
MASKS;
PHOTORESISTS;
ELECTRON PROJECTION;
OFF AXIS ILLUMINATION;
OPTICAL PROXIMITY EFFECT CORRECTION;
RESOLUTION ENHANCEMENT TECHNOLOGIES;
SCALPEL SYSTEM;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 0032627766
PISSN: 00189235
EISSN: None
Source Type: Journal
DOI: 10.1109/6.774964 Document Type: Article |
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Times cited : (6)
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References (0)
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