Effect of DC bias on the deposition rate using RF-DC coupled magnetron sputtering for Mg thin films

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 57-59

  Tanaka, T ^a   Suzuki, M ^a   Kawabata, K ^a  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Deposition process; Hydrogen storage; Magnesium; RF DC; Sputtering; X ray diffraction

Indexed keywords

CURRENT DENSITY; FILM GROWTH; GLOW DISCHARGES; HYDROGEN; ION BOMBARDMENT; MAGNESIUM; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HYDROGEN STORAGE MATERIALS;

METALLIC FILMS;

EID: 0032627474     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01573-9     Document Type: Article

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