SCOPUS 정보 검색 플랫폼

Shinku/Journal of the Vacuum Society of Japan

Volumn 42, Issue 1, 1999, Pages 31-36

Proposal of near-infrared laser diode spectroscopy at 1.74 μm for HCl monitor in semiconductor processes

(7) Masusaki, Hiroshi a Satoh, Takayuki a Ubukata, Akinori a Wu, Shang Quin a Matsumoto, Koh a Kuze, Hiroaki b Takeuchi, Nobuo b

a TAIYO NIPPON SANSO CORPORATION (Japan)

b CHIBA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; EPITAXIAL GROWTH; HYDROCHLORIC ACID; INFRARED SPECTROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR LASERS; SPECTROSCOPIC ANALYSIS; TRACE ANALYSIS;

NEAR-INFRARED LASER DIODE SPECTROSCOPY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032627115 PISSN: 05598516 EISSN: None Source Type: Journal
DOI: 10.3131/jvsj.42.31 Document Type: Article

Times cited : (4)

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