Thermal plasma deposition of nanostructured films

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 46-47

  Neuman, A ^a   Blum, J ^a   Tymiak, N ^a   Wong, Z ^a   Rao, N P ^a   Gerberich, W ^a   McMurry, P H ^a   Heberlein, J V R ^a   Girshick, S L ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; PLASMA FLOW; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE;

NANOSTRUCTURED FILM; THERMAL PLASMA DEPOSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032626764     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763025     Document Type: Article

References (3)

1. N. P. Rao, N. Tymiak, J. Blum, A. Neuman, H. J. Lee, S. L. Girshick, P. H. McMurry, and J. Heberlein, "Hypersonic plasma particle deposition of nanostructured silicon and silicon carbide," J. Aerosol Sci., vol. 29, pp. 707-720, 1998.
2. J. Fernndez de la Mora, S. V. Hering, N. Rao, and P. H. McMurry, "Hypersonic impaction of ultrafine particles," J. Aerosol Sci, vol. 21, no. 2, pp. 169-187, 1990.
3. J. Fernndez de la Mora, "Surface impact of seeded jets at relatively large background densities," J. Chem. Phys., vol. 82, no. 7, pp. 3453-3464, 1985.