Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 625-632

  Kim, Jin Baek ^a   Park, Jong Jin ^a   Jang, Ji Hyun ^a   Kim, Jae Young ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; DIFFUSION IN SOLIDS; HYDROLYSIS; POLYACRYLATES; POLYMERIZATION; POLYMETHYL METHACRYLATES; SYNTHESIS (CHEMICAL);

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0032626750     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350247     Document Type: Conference Paper

References (12)