Synthesis of diamond by thermal plasma processing under low pressure

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 63, Issue 1, 1999, Pages 55-61

  Sakiyama, Satoshi ^a   Fukumasa, Osamu ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Diamond synthesis; Medium pressure; Plasma jet; Plasma processing; Spectroscopic measurement; Thermal plasma

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGEN; METHANE; MORPHOLOGY; PLASMA JETS; PRESSURE EFFECTS; SPECTROSCOPIC ANALYSIS; SYNTHESIS (CHEMICAL);

THERMAL PLASMAS;

DIAMOND FILMS;

EID: 0032625113     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.63.1_55     Document Type: Article

References (14)

1. K. Kurihara, K. Sasaki, M. Kawarada and N. Koshino : Appl. Phys. Lett., 52 (1988), 437.
2. S. Matsumoto, I. Hosoya and T. Chounan: Jpn. J. Appl. Phys., 29(1990), 2082.
3. N. Ohtake and M. Yoshikawa: J. Electrochem. Soc. 137(1990), 718.
4. Z. P. Lu, L. Stachowicz, P. Kong, J. Heberlein and E. Pfender: Plasma Chemistry and Plasma Processing, 11(1991), 387.
5. A. Hirata, T. Uchida and M. Yoshikawa: J. Jpn. Soc. Precis. Eng., 60(1994), 591.
6. K. Eguchi, S. Yata and T. Yoshida: Appl. Phys. Lett., 64(1994), 58.
7. S. Matsumoto, Y. Manabe and Y. Hibino: J. Mater. Sci., 27(1992), 5905.
8. S. Sakiyama, O. Fukumasa and K. Aoki: Jpn. J. Appl. Phys., 33(1994), 4409.
9. S. Sakiyama, T. Hirabaru and O. Fukumasa: Rev. Sci. Instrum., 63(1992), 2408.
10. S. Sakiyama, O. Fukumasa, K. Aoki, T. Murakami and H. Arashi: Advances in New Diamond Science and Technology, (1994), p. 81.
11. S. Sakiyama, O. Fukumasa, T. Murakami and T. Kobayashi: Jpn. J. Appl. Phys., 36(1997), 5003.
12. V. G. Ralchenko, A. A. Smolin, V. I. Konov, K. F. Sergeichev, I. A. Sychov, I. I. Vlasov, V. V. Migulin, S. V. Voronia and A. V. Khomich : Diamond and Related Materials, 6(1997), 417.