Toward nanometer accuracy measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue II, 1999, Pages 1017-1028

  Kramar, John ^a   Amatucci, Edward ^a   Gilsinn, David ^a   Jun, Jau Shi ^a   Penzes, William ^a   Scire, Fredric ^a   Teague, E Clayton ^a   Villarrubia, John ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; INTERFEROMETRY; LASERS; SCANNING TUNNELING MICROSCOPY;

MICHELSON INTERFEROMETRY; MOLECULAR MEASURING MACHINE; NANOMETER ACCURACY MEASUREMENT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032624087     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350791     Document Type: Conference Paper

References (13)