|
|
Volumn 3676, Issue I, 1999, Pages 1-8
|
|
Cost analysis on the next generation lithography technology
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
COST BENEFIT ANALYSIS;
COST EFFECTIVENESS;
ELECTRON BEAM LITHOGRAPHY;
ION BEAM LITHOGRAPHY;
MASKS;
MATHEMATICAL MODELS;
PHOTORESISTS;
ULTRAVIOLET RADIATION;
X RAY LITHOGRAPHY;
ELECTRON BEAM SCANNING;
EXTREME ULTRAVIOLET RADIATION;
ION PROJECTION LITHOGRAPHY (IPL);
NEXT GENERATION LITHOGRAPHY (NGL) TECHNOLOGY;
PROXIMITY X RAY LITHOGRAPHY (PXRL);
LITHOGRAPHY;
|
|
EID: 0032624061
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.351075 Document Type: Conference Paper |
|
Times cited : (3)
|
|
References (8)
|
