Automatic in-situ focus monitor using line shortening effect

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 184-193

  Kim, Young Chang ^a   Yeo, Gi Sung ^a   Lee, Jae Han ^a   Kim, Hak ^a   Chung, U In ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; MASKS;

AUTOMATIC IN-SITU FOCUS MONITORING (AIFM);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032624053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350806     Document Type: Conference Paper

References (3)