Synthesis and characterization of siliceous and aluminum-containing mesoporous materials from different surfactant solutions

Microporous and Mesoporous Materials

Volumn 27, Issue 2-3, 1999, Pages 171-180

  Øye, Gisle ^a   Sjöblom, Johan ^a   Stöcker, Michael ^b  

^a UNIVERSITY OF BERGEN   (Norway)

^b SINTEF   (Norway)

Author keywords

Adsorption isotherms; Al MCM 48; High resolution microscopy; MCM 48; Surfactant solutions; X ray diffraction

Indexed keywords

ADSORPTION ISOTHERMS; ALUMINUM COMPOUNDS; ELECTROPHORESIS; HIGH RESOLUTION ELECTRON MICROSCOPY; HYDROCARBONS; MOLECULAR STRUCTURE; POROUS MATERIALS; SILICON COMPOUNDS; SOLUTIONS; SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL); X RAY POWDER DIFFRACTION;

BRUNAUER-EMMET-TELLER (BET) ISOTHERMS; MESOPOROUS MATERIALS; MOLECULAR PACKING RATIOS;

MOLECULAR SIEVES;

EID: 0032623725     PISSN: 13871811     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1387-1811(98)00251-0     Document Type: Article

References (32)

1. Wilson S.T., Lok B.M., Messina C.A., Cannan T.R., Flanigen E.M. J. Am. Chem. Soc. 104:1982;1146.
2. Davis M.E., Saldarriaga C., Montes C., Garces J., Crowder C. Nature. 331:1988;698.
3. Estermann M., McCusker L.B., Baerlocher C., Merrouche A., Kessler H.A. Nature. 352:1991;320.
4. Jones R.H., Thomas J.M., Chen J., Xu R., Huo Q., Li S., Ma Z., Chippindale A.M. J. Solid State Chem. 102:1993;204.
5. Kresge C.T., Leonowicz M.E., Roth W.J., Vartuli J.C., Beck J.S. Nature. 359:1992;710.
6. Beck J.S., Vartuli J.C., Roth W.J., Leonowicz M.E., Kresge C.T., Schmitt K.D., Chu C.T.-W., Olson D.H., Sheppard E.W., McCullen S.B., Higgins J.B., Schlenker J.L. J. Am. Chem. Soc. 114:1992;10834.
7. Schmidt R., Akporiaye D., Stöcker M., Ellestad O.H. Stud. Surf. Sci. Catal. 84:1994;61.
8. Schmidt R., Akporiaye D., Stöcker M., Ellestad O.H. J. Chem. Soc., Chem. Commun. 12:1994;1493.
9. Zhao X.S., Lu G.Q., Millar G.J. Ind. Eng. Chem. Res. 35:1996;2075.
10. Schmidt R., Stöcker M., Akporiaye D., Törstad E.H., Olsen A. Microporous Mater. 5:1995;1.
11. Romero A.A., Alba M.D., Zhou W., Klinowski J. J. Phys. Chem. B. 101:1997;5294.
12. Morey M., Davidson A., Stucky G. Microporous Mater. 6:1996;99.
13. Echchahed B., Moen A., Nicholson D., Bonneviot L. Chem. Mater. 9:1997;1716.
14. Pu S.B., Kim J.B., Seno M., Inui T. Microporous Mater. 10:1997;25.
15. Romero A.A., Alba M.D., Klinowski J. J. Phys. Chem. B. 102:1998;123.
16. Schmidt R., Junggreen H., Stöcker M. J. Chem. Soc., Chem. Commun. 7:1996;875.
17. Alfredsson V., Anderson M.W. Chem. Mater. 8:1996;1141.
18. D.F. Evans, H. Wennerström, The Colloidial Domain. Where Physics, Chemistry, Biology and Technology Meet, VCH Publishers, New York, 1994.
19. Rasmusson M., Wall S. Coll. Surf. A: Physiochem. Eng. Asp. 122:1997;169.
20. R.K. Iler, The Chemistry of Silica, Wiley, New York, 1979.
21. Brunauer S., Deming L.S., Deming W.S., Teller E. J. Am. Chem. Soc. 62:1940;1723.
22. Sjöblom J., Lindberg R., Friberg S.E. Adv. Coll. Interface Sci. 95:1996;125.
23. Israelachvili J.N., Mitchell D.J., Ninham B.W. J. Chem. Soc., Faraday Trans. 2. 72:1976;1525.
24. Zana R. Adv. Coll. Interface Sci. 57:1995;1.
25. J. Sjöblom, P. Stenius, I. Danielsson, in: M.J. Schick (Ed.), Nonionic Surfactants. Physical Chemistry, Surface Science Series vol. 23, Dekker, New York, 1987, p. 369.
26. Aamodt M., Landgren M., Jönsson B. J. Phys. Chem. 96:1992;945.
27. Monnier A., Schüth F., Huo Q., Kumar D., Margolese D., Maxwell R.S., Stucky G.D., Krishnamurty M., Petroff P., Firouzi A., Janicke M., Chmelka B.F. Science. 261:1993;1299.
28. Huo Q., Margolese D.I., Ciesla U., Demuth D.G., Feng P., Gier T.E., Sieger P., Firouzi A., Chmelka B.F., Schüth F., Stucky G.D. Chem. Mater. 6:1994;1176.
29. Firouzi A., Kumar D., Bull L.M., Besier T., Sieger P., Huo Q., Walker S.A., Zasadzinski J.A., Glinka C., Nicol J., Margolese D., Stucky G.D., Chmelka B.F. Science. 267:1995;1138.
30. Tanev P.T., Pinnavaia T.J. Science. 267:1995;865.
31. Friberg S.E., Ma Z. J. Non-Cryst. Solids. 147/148:1992;30.
32. C.J. Brinker, G.W. Scherer, Sol-Gel Science. The Physics and Chemistry of Sol-Gel Processing, Academic Press, New York, 1990.