Palladium silicide/oxide formations in Pd/SiO2 complex films

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 119-122

  Ichinohe, T ^a   Masaki, S ^a   Kawasaki, K ^b   Morisaki, H ^c  

^a TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b TDY Co Ltd   (Japan)

^c UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

Composite film; Ion beam; Silicide

Indexed keywords

ION BEAMS; PALLADIUM COMPOUNDS; SPUTTER DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITE FILMS; ION-BEAM SPUTTER DEPOSITION METHODS;

METALLIC FILMS;

EID: 0032623616     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01626-5     Document Type: Article

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