Laser-assisted transfer of silicon by explosive hydrogen release

Applied Physics Letters

Volumn 74, Issue 15, 1999, Pages 2170-2172

  Toet, D ^a   Thompson, Michael O ^b   Smith, P M ^a   Sigmon, T W ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCIMER LASERS; HYDROGEN; LASER BEAM EFFECTS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

EXPLOSIVE HYDROGEN RELEASE;

SEMICONDUCTING FILMS;

EID: 0032621460     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123790     Document Type: Article

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