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Volumn , Issue , 1999, Pages 181-185
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Uniformity control of rate enhanced reactive AC sputtering
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ANODES;
ARGON;
ELECTRIC POWER SUPPLIES TO APPARATUS;
GLASS;
MAGNETIC FIELD EFFECTS;
OXIDES;
RATE CONSTANTS;
THICKNESS CONTROL;
THIN FILMS;
RATE ENHANCED REACTIVE AC SPUTTERING;
THIN FILM UNIFORMITY;
UNIFORMITY CONTROL;
SPUTTER DEPOSITION;
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EID: 0032620914
PISSN: 07375921
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (3)
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