Imaging properties of beam line optics for undulator based third generation synchrotron facilities

Review of Scientific Instruments

Volumn 70, Issue 1 PART II, 1999, Pages 14-17

  Sundin, S ^a,d   Bassler M ^a,b   Deneche, R ^a,b   Weiss, M ^c   Vaterlein P ^a,b   Nilsson, A ^a   Svensson, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b LUND UNIVERSITY   (Sweden)

^c HAHN MEITNER INSTITUT   (Germany)

^d UNIVERSITY OF GÄVLE   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; FOCUSING; IMAGING SYSTEMS; OPTICAL DEVICES; PHOTONS; SYNCHROTRON RADIATION;

BEAM LINE OPTICS; PHOTON ENERGY; UNDULATOR;

ELECTRON OPTICS;

EID: 0032620645     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149535     Document Type: Review

References (7)

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2. Å. Andersson, M. Eriksson, and O. Chubar, Internal Report, MAX-Lab.
3. W. Demtröder, Laser Spectroscopy Basic Concepts and Instrumentation. (Springer, Berlin, 1982).
4. F. L. Pedrotti and L. S. Pedrotti, Introduction to Optics (Prentice Hall, Englewood Cliffs, NJ, 1993).
5. B. Lai and F. Cerrina, Nucl. Instrum. Methods Phys. Res. A 246, 337 (1986).
6. B. Lai, K. Chapman, and F. Cerrina, Nucl. Instrum. Methods Phys. Res. A 266, 544 (1988).
7. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Oxford, 1980).