Crystallinity evaluation of phosphorus-doped n-type diamond thin film

Journal of Applied Physics

Volumn 85, Issue 7, 1999, Pages 3931-3933

  Shimomura, M ^a   Nishimori, T ^b   Aukawa, T ^a   Takakuwa, Y ^a   Sakamoto, H ^b   Kono, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; FILM GROWTH; MOLECULAR BEAM EPITAXY; PHOSPHORUS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

GAS SOURCE MOLECULAR BEAM EPITAXY (GSMBE); X-RAY PHOTOELECTRON DIFFRACTION (XPD);

DIAMOND FILMS;

EID: 0032615234     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369769     Document Type: Article

References (13)

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