Direct transition at the fundamental gap in light-emitting nanocrystalline Si thin films

Applied Physics Letters

Volumn 74, Issue 22, 1999, Pages 3323-3325

  Toyama, Toshihiko ^a   Kotani, Yoshihiro ^a   Shimode, Akihito ^a   Okamoto, Hiroaki ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ELECTRON TRANSITIONS; EMISSION SPECTROSCOPY; ENERGY GAP; LIGHT ABSORPTION; LIGHT REFLECTION; LIGHT TRANSMISSION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; THIN FILMS;

ELECTROREFLECTANCE SPECTROSCOPY;

OPTICAL FILMS;

EID: 0032614555     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123332     Document Type: Article

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