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Volumn , Issue , 1999, Pages 91-95
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Ion-assisted filtered cathodic arc deposition (IFCAD) system for volume production of thin-film coatings
a
a
Arc Corporation
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ANTIREFLECTION COATINGS;
COMPUTER CONTROL SYSTEMS;
ION BEAMS;
MULTILAYERS;
PLASMA APPLICATIONS;
PROTECTIVE COATINGS;
THIN FILMS;
VAPORIZATION;
ABRASION RESISTANT COATINGS;
ARC VAPORIZATION;
CATHODIC ARC DEPOSITION;
ELECTROMAGNETIC FILTERING;
MECHANICAL FILTERING;
PLASMA BEAM SCANNING SYSTEM;
THIN FILM COATINGS;
VOLUME PRODUCTION;
WEAR RESISTANT COATINGS;
DEPOSITION;
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EID: 0032614471
PISSN: 07375921
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (9)
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References (10)
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