Electron-beam irradiation-induced nonlinearity in silicate glass films and fabrication of nonlinear optical gratings

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2393-2396

  Nakanishi, Makoto ^a   Sugihara, Okihiro ^a   Okamoto, Naomichi ^a   Fujimura, Hisashi ^a   Egami, Chikara ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DOPING (ADDITIVES); ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON IRRADIATION; FUSED SILICA; NONLINEAR OPTICS; OPTICAL GLASS; SECOND HARMONIC GENERATION; SPUTTERING;

ELECTRON BEAM WRITING; GERMANOSILICATE GLASS; NONLINEAR OPTICAL COEFFICIENT;

OPTICAL FILMS;

EID: 0032614203     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371066     Document Type: Article

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