Ion bombardment characteristics during the growth of optical films using a cold cathode ion source

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1999, Pages 267-272

  Zabeida, O ^a   Klemberg Sapieha, J E ^a   Martinu, L ^a   Morton, D E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ARGON; DEPOSITION; ELECTRON BEAMS; EVAPORATION; FILM GROWTH; ION BEAMS; ION SOURCES; OPTICAL FILMS; SURFACE TREATMENT; TANTALUM COMPOUNDS; TITANIUM OXIDES;

COLD CATHODE ION SOURCE; ION BEAM ASSISTED DEPOSITION; ION ENERGY ANALYSIS; ION ENERGY DISTRIBUTION FUNCTIONS; TANTALUM OXIDES;

ION BOMBARDMENT;

EID: 0032613629     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)