Nucleation of chemical vapor deposited silicon nitride on silicon dioxide

Applied Physics Letters

Volumn 74, Issue 13, 1999, Pages 1830-1832

  Copel, M ^a   Varekamp, P R ^a   Kisker, D W ^a,c   McFeely, F R ^a   Litz, K E ^b   Banaszak Holl, M M ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c Oplink Communications Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COALESCENCE; EVAPORATION; FREE ENERGY; INTERFACES (MATERIALS); INTERFACIAL ENERGY; NUCLEATION; OXIDATION; SILICA; STOICHIOMETRY; WETTING;

MEDIUM ENERGY ION SCATTERING;

SILICON NITRIDE;

EID: 0032608178     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123100     Document Type: Article

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