Raman imaging of stress in a SiGe/Si photoelastic optical channel waveguide structure

Applied Physics Letters

Volumn 75, Issue 9, 1999, Pages 1287-1289

  Rho, H ^a   Jackson, Howard E ^a   Weiss, B L ^b  

^a UNIVERSITY OF CINCINNATI   (United States)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; LIGHT POLARIZATION; PHONONS; PHOTOELASTICITY; RAMAN SCATTERING; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; STRAIN; STRESS ANALYSIS; THERMAL EXPANSION;

PHOTOELASTIC OPTICAL CHANNEL WAVEGUIDE STRUCTURES; RAMAN IMAGING;

OPTICAL WAVEGUIDES;

EID: 0032607687     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124670     Document Type: Article

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