High rate sputter deposition of TiO2 from TiO2-x target

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1999, Pages 286-289

  Tachibana, Y ^a   Ohsaki, H ^a   Hayashi, A ^a   Mitsui, A ^a   Hayashi, Y ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELLIPSOMETRY; ION BOMBARDMENT; MAGNETRON SPUTTERING; OPTICAL FILMS; OPTICAL PROPERTIES; PHOTOCONDUCTIVITY; PLASMA SPRAYING; REFRACTIVE INDEX; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILE; FILM THICKNESS; LOW EMISSIVITY COATING;

OPTICAL COATINGS;

EID: 0032606494     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)