Dielectric properties of alkoxy-derived Sr2Nb2O7 thin films crystallized via rapid thermal annealing

Applied Physics Letters

Volumn 75, Issue 4, 1999, Pages 561-562

  Shoyama, Masashi ^a   Tsuzuki, Akihiro ^b   Kato, Kazumi ^b   Murayama, Norimitsu ^b  

^a Mie Prefecture Industrial Research Institute   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; FERROELECTRIC MATERIALS; FILM PREPARATION; PERMITTIVITY; RAPID THERMAL ANNEALING; SOL-GELS; SPUTTERING; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

METALORGANIC DECOMPOSITIONS (MOD); NONDESTRUCTIVE READ OUT (NDRO);

DIELECTRIC FILMS;

EID: 0032606326     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124422     Document Type: Article

References (9)

1. Y. Fujimori, N. Izumi, T. Nakamura, A. Kamisawa, and Y. Shigematsu, Jpn. J. Appl. Phys., Part 1 36, 5935 (1997).
2. S. Nanamatsu, M. Kimura, K. Doi, and M. Takahashi, J. Phys. Soc. Jpn. 30, 300 (1970).
3. K. Nashimoto and S. Nakamura, Jpn. J. Appl. Phys., Part 1 33, 5147 (1994).
4. K. Kato, C. Zheng, J. M. Finder, S. K. Dey, and Y. Torii, J. Am. Ceram. Soc. 81, 1869 (1998).
5. A. Ishitani and M. Kimura, Appl. Phys. Lett. 29, 289 (1976).
6. C. H. Son, H. D. Nam, S. W. Jang, and H. Y. Lee, J. Korean Phys. Soc. 32, S1434 (1998).
7. A. V. Prasadarao, U. Selvaraj, and S. Komarneni, J. Mater. Res. 10, 704 (1995).
8. M. Fukuhara, C. Y. Huang, A. S. Bhalla, and R. E. Newnham, J. Mater. Sci. 26, 61 (1991).
9. G. A. Smolenskii, V. A. Isupov, and A. I. Agranovskaia, Sov. Phys. Dokl. 1, 300 (1956).