Film thickness measurement and linear dichroism of organic thin films prepared by molecular beam deposition at oblique incidence

Optical Materials

Volumn 12, Issue 2, 1999, Pages 345-350

  Müller, Bert ^a,b   Jäger, Matthias ^b   Tao, Ye ^b   Kündig, Armin ^b   Cai, Chengzhi ^b   Bosshard, Christian ^b   Günter, Peter ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELLIPSOMETRY; FUSED SILICA; GLASS; MOLECULAR BEAMS; OPTICAL PROPERTIES; ORGANIC ACIDS; SUBSTRATES; THICKNESS MEASUREMENT; ULTRAVIOLET SPECTROSCOPY; VACUUM APPLICATIONS;

IN SITU ELLIPSOMETRY; LINEAR DICHROISM; OPTICAL ANISOTROPY; OPTICAL CONSTANTS; ORGANIC THIN FILMS; ULTRA HIGH VACUUM CONDITIONS;

THIN FILMS;

EID: 0032599631     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(99)00065-8     Document Type: Article

References (9)

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8. C. Cai, Y. Tao, B. Müller, unpublished.
9. A. Rodger, B. Norden, Circular Dichroism and Linear Dichroism, Oxford University Press, Oxford, New York, Tokyo, 1997.