Anisotropy in metallic thin films patterned by the atomic saw method

Journal of Magnetism and Magnetic Materials

Volumn 203, Issue 1-3, 1999, Pages 132-134

  Jaffres H ^a   Ressier, L ^a   Michelini, F ^a   Chandesris, D ^b   Le Fevre P ^b   Magnan, H ^b   Gauffier, J L ^a   Mamy, R ^a   Goiran, M ^a   Peyrade, J P ^a   Bobo, J F ^a   Ousset, J C ^a   Redoules J P ^a   Bertrand, D ^b   Fert, A R ^a  

^a CNRS   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Anisotropy; EXAFS; Nanostructures

Indexed keywords

EID: 0032599249     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(99)00212-7     Document Type: Article

References (4)

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2. H. Jaffrès, L. Ressier, K. Postava, A. Schuhl, F. Nguyen Van Dau, M. Goiran, J.P. Redoulès, J.P. Peyrade, A.R. Fert, J. Magn. Magn. Mater. 184 (1998) 19.
3. L. Ressier, A. Schuhl, F. Nguyen Van Dau, K. Postava, M. Goiran, J.P. Peyrade, A.R. Fert, J. Appl. Phys. 81 (8) (1997) 5464.
4. D.T. Jiang, E.D. Crozier, B. Heinrich, Phys. Rev. B 44 (12) (1991) 6401.