New self-convergent programming and erase tightening by substrate-hot-electron injection for ETOX cells in triple-well

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 1999, Pages 199-202

  Chi, Min hwa ^a   Chen, Chih Ming ^a   Hung, Chih Wei ^a   Wang, Yu Hsiung ^a  

^a Manufacturing Corp   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; GATES (TRANSISTOR); SEMICONDUCTOR DEVICE STRUCTURES; SUBSTRATES; THRESHOLD VOLTAGE;

CHANNEL HOT ELECTRON INJECTION; SELF CONVERGENT PROGRAMMING; SUBSTRATE HOT ELECTRON INJECTION;

COMPUTER PROGRAMMING;

EID: 0032599208     PISSN: 1524766X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)