A numerical model for simulating axisymmetric rod growth in three-dimensional laser chemical vapor deposition

Numerical Heat Transfer; Part A: Applications

Volumn 36, Issue 3, 1999, Pages 251-262

  Dai, W ^a   Nassar, R ^a   Zhang, C ^a   Shabanian, S ^a   Maxwell, J ^b  

^a Louisiana Tech University   (United States)

^b LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LASER APPLICATIONS; LASER BEAMS; THREE DIMENSIONAL;

AXISYMMETRIC ROD GROWTH; THREE DIMENSIONAL LASER CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 0032598430     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/104077899274741     Document Type: Article

References (13)

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