Homoepitaxial growth of NdBa2Cu3O7-y films by metalorganic chemical vapor deposition

Journal of Crystal Growth

Volumn 205, Issue 3, 1999, Pages 277-283

  Komatsu, M ^a   Wang, F ^a   Tanaka, N ^a   Zama, H ^a   Morishita, T ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; NEODYMIUM COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; SUPERCONDUCTING FILMS; X RAY CRYSTALLOGRAPHY;

COLD WALL LATERAL FLOW REACTOR; HOMOEPITAXIAL FILMS; NEODYMIUM BARIUM CUPRATES;

HIGH TEMPERATURE SUPERCONDUCTORS;

EID: 0032598147     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00285-7     Document Type: Article

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