Growth-rate dependence of the thermal conductivity of chemical-vapor-deposited diamond

Journal of Materials Research

Volumn 14, Issue 9, 1999, Pages 3720-3724

  Balzaretti, Naira M ^a,c   Feldman, Albert ^a   Etz, Edgar S ^a   Gat, Roy ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Coatings Technology Solutions Inc ^*  (United States)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SYNTHETIC DIAMONDS; THERMAL CONDUCTIVITY OF SOLIDS; THERMAL DIFFUSION IN SOLIDS;

MICROWAVE PLASMA REACTORS;

DIAMOND FILMS;

EID: 0032595530     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0502     Document Type: Article

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