Highly conducting undoped μc-SiO:H films prepared by RF glow discharge

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 7 A, 1999, Pages

  Das, Debajyoti ^a   Barua, Asok K ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; CRYSTALLOGRAPHY; ELECTRON DIFFRACTION; GLOW DISCHARGES; HYDROGEN; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILICA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

RADIO FREQUENCY GLOW DISCHARGES;

CONDUCTIVE FILMS;

EID: 0032594985     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l697     Document Type: Article

References (15)