Local transport property on ferromagnetic tunnel junction measured using conducting atomic force microscope

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 7 A, 1999, Pages

  Ando, Yasuo ^a   Kameda, Hiroshi ^a   Kubota, Hitoshi ^a   Miyazaki, Terunobu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; COBALT; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; FERROMAGNETIC MATERIALS; MAGNETORESISTANCE; NICKEL COMPOUNDS; VOLTAGE MEASUREMENT;

FERROMAGNETIC TUNNEL JUNCTIONS; TOTAL MAGNETORESISTANCE RATIO (TMR);

TUNNEL JUNCTIONS;

EID: 0032594958     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l737     Document Type: Article

References (11)