Deposition mechanisms in plasma-enhanced chemical vapor deposition of titanium

Electrochemical and Solid-State Letters

Volumn 2, Issue 10, 1999, Pages 531-533

  Itoh, T ^a   Chang, M ^a   Ellwanger, R ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HYDROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; THERMAL EFFECTS; TITANIUM COMPOUNDS;

TITANIUM CHLORIDE;

TITANIUM;

EID: 0032594199     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390893     Document Type: Article

References (9)

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