Hardness of compositionally nano-modulated TiN films

Nanostructured Materials

Volumn 12, Issue 5, 1999, Pages 807-810

  Kusano, E ^a   Kitagawa, M ^a   Satoh, A ^a   Kobayashi, T ^a   Nanto, H ^a   Kinbara, A ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HARDNESS; MIXTURES; NANOSTRUCTURED MATERIALS; NITROGEN; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; TITANIUM; TITANIUM DIOXIDE; TITANIUM NITRIDE; VICKERS HARDNESS TESTING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

METALLIC LAYERS; NANOINDENTATION; NANOMODULATED FILMS; REACTIVE GAS FLOW RATE MODULATION SPUTTERING;

METALLIC FILMS;

EID: 0032593980     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(99)00240-8     Document Type: Article

References (5)

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3. Chu, X., Barnett, S.A., Wong, M.S., and Sproul, W.D., Surf.Coat.Technol., 57, 13, 1993
4. Kusano, E., Kinbara, A., Kondo, I., J. Non-crystalline Solids, 218, 58, 1997
5. Kusano, E., Kitagawa, M., Nanto, H., Kinbara, A., J.Vac.Sci.Technol. A, in presss