HOYA deep UV EAPSM blanks development status

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3665, Issue , 1999, Pages 9-17

  Ushida, Masao ^a   Kobayashi, Hideo ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HISTORY; ULTRAVIOLET RADIATION;

EMBEDDED ATTENUATED PHASE-SHIFT MASKS (EAPSM); RESOLUTION ENHANCEMENT TECHNIQUE (RET);

MASKS;

EID: 0032593623     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.346216     Document Type: Conference Paper

References (7)