Microstructure change in Co46Al19O35 granular thin films by annealing

Nanostructured Materials

Volumn 12, Issue 1, 1999, Pages 573-576

  Ohnuma, M ^a   Hono, K ^a   Onodera, H ^a   Mitani, S ^b   Ha, J G ^b   Fujimori, H ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CRYSTAL MICROSTRUCTURE; ELECTRON DIFFRACTION; OXIDATION; OXIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ALUMINUM OXIDES; GRANULAR THIN FILMS; MICROSTRUCTURE CHANGE; SMALL ANGLE X RAY SCATTERING;

COBALT COMPOUNDS;

EID: 0032593224     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(99)00186-5     Document Type: Article

References (6)

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4. J.G.Ha, S.Mitani, K.Tkanashi and H.Fujimori, J. Magn. Magn. Mater, to be published
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