Oxygen diffusion in silica glass prepared by the sol-gel method

Solid State Communications

Volumn 111, Issue 12, 1999, Pages 717-721

  Garcia Rodriguez F J ^a   Perez Robles F ^b   Manzano Ramirez A ^b   Vorobiev, Y V ^b   Gonzalez Hernandez J ^b  

^a UNIVERSIDAD AUTÓNOMA DE QUERÉTARO   (Mexico)

^b Centro de Investigaciones y de Estudios Avanzados   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AUGER ELECTRON SPECTROSCOPY; COATINGS; DEPOSITION; DIFFUSION IN SOLIDS; HEAT TREATMENT; INTERFACES (MATERIALS); OXYGEN; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; THICKNESS MEASUREMENT; THIN FILMS;

AUGER DEPTH PROFILE MEASUREMENT; INELASTIC LIGHT SCATTERING; SOL-GEL METHOD;

FUSED SILICA;

EID: 0032592849     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(99)00237-9     Document Type: Article

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