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Volumn 146, Issue 8, 1999, Pages 2901-2905

Effect of thermophoresis on particle deposition in a tungsten low pressure chemical vapor deposition reactor

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; HEAT TRANSFER; MATHEMATICAL MODELS; SILICON WAFERS; SUBSTRATES; TEMPERATURE; THERMAL GRADIENTS; TRANSPORT PROPERTIES; TUNGSTEN;

EID: 0032592429     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392026     Document Type: Article
Times cited : (6)

References (12)
  • 6
    • 0345646766 scopus 로고
    • Personal communication, Intel, Santa Clara, CA
    • S. Tripathi, Personal communication, Intel, Santa Clara, CA (1994).
    • (1994)
    • Tripathi, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.