|
Volumn 146, Issue 8, 1999, Pages 2901-2905
|
Effect of thermophoresis on particle deposition in a tungsten low pressure chemical vapor deposition reactor
a,c a b |
Author keywords
[No Author keywords available]
|
Indexed keywords
CHEMICAL REACTORS;
CHEMICAL VAPOR DEPOSITION;
HEAT TRANSFER;
MATHEMATICAL MODELS;
SILICON WAFERS;
SUBSTRATES;
TEMPERATURE;
THERMAL GRADIENTS;
TRANSPORT PROPERTIES;
TUNGSTEN;
PARTICLE DEPOSITION;
THERMOPHORESIS;
TUNGSTEN LOW PRESSURE CHEMICAL VAPOR DEPOSITION REACTOR;
PARTICLES (PARTICULATE MATTER);
|
EID: 0032592429
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1392026 Document Type: Article |
Times cited : (6)
|
References (12)
|