Properties and orientation of antiferroelectric lead zirconate thin films grown by MOCVD

Materials Research Society Symposium - Proceedings

Volumn 541, Issue , 1999, Pages 345-350

  Chen, Nan ^a   Bai, G R ^a   Auciello, O ^a   Koritala, R E ^b   Lanagan, M T ^b  

^a Materials Science Division   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRIC FIELD EFFECTS; ELECTRIC PROPERTIES; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHASE TRANSITIONS; PLATINUM COMPOUNDS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ANTIFERROELECTRIC LEAD ZIRCONATE THIN FILMS; PSEUDOCUBIC ORIENTATION;

LEAD COMPOUNDS;

EID: 0032592314     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (17)

1. G.Shirane, E. Sawaguchi, and Y. Takagi, Phys. Rev. 84, 476 (1951).
2. E. Sawaguchi, H. Maniwa, and S. Hoshino, Phys. Rev. 83, 1078 (1951).
3. T. Tani, J. F. Li, D. Viehland, and D. A. Payne, J. Appl. Phys. 75, 3017 (1994).
4. I. Kanno, S. Hayashi, M. Kitagawa, R. Takayama, and T. Hirao, Appl. Phys. Lett. 66, 145 (1995).
5. K. K. Li, F. Wang, and G.H. Haertling, J. Mater. Sci. 30, 1386 (1995).
6. K. Yamakawa, S. Trolier-McKinstry, J. P. Dougherty, and S. B. Krupanidhi, Appl. Phys. Lett. 67, 2014 (1995).
7. G. J. M. Dormans, M. de Keijser, and P. J. van Veldhoven, Mater. Res. Soc. Symp. Proc. 243, 203 (1992).
8. G. R. Bai, H. L. M. Chang, D. J. Lam, and Y. Gao, Appl. Phys. Lett. 62, 1754 (1993).
9. M. Shimizu, M. Sugiyama, H. Fujisawa, and T. Shiosaki, Jpn. J. Appl. Phys. 33, 5167 (1994).
10. C. M. Foster, S. K. Chan, M. Chang, R. P. Chiarello, T. J. Zhang, J. Guo, and D. J. Lam, J. Appl. Phys. 73, 7823 (1993).
11. T. Shiosaki, H. Fujisawa, and M. Shimizu, IEEE Proc. 10th Internat. Symp. Appl. Ferro. 1, 45 (1996).
12. N. Chen, G. R. Bai, C. M. Foster, O. Auciello,M. J. Brukman, and M. T. Lanagan, Ceram. Trans., in press (1998).
13. O. Auciello, K. D. Gifford, and A. I. Kingon, Appl. Phys. Lett. 64, 2873 (1994).
14. K. Aoki, Y. Fukuda, K. Numata, and A. Nishimura, Jpn. J. Appl. Phys. 34, 192 (1995).
15. G. J. Willems, D. J. Wouters, and H. E. Maes, Integrated Ferro. 15, 19 (1997).
16. P. Muralt, T. Maeder, L. Sagalowicz, S. Hiboux, S. Scalese, D. Namuovic, R. G. Agostino, N. Xanthopoulos, H. J. Mathieu, L. Patthey, and E. L. Bullock, J. Appl. Phys. 88, 3835 (1998).
17. K. Yamakawa, S. Trolier-McKinstry, and J. P. Dougherty, IEEE Proc. 10th Internat. Symp. Appl. Ferro. 1, 405 (1996).