Multiscale simulations of the RF diode sputtering of copper

Materials Research Society Symposium - Proceedings

Volumn 538, Issue , 1999, Pages 323-328

  Wadley, H N G ^a   Zou, W ^a   Zhou, X W ^a   Groves, J F ^a   Desa, S ^a   Kosut, R ^a   Abrahamson, E ^a   Ghosal, S ^a   Kozak, A ^a   Wang, D X ^a  

^a UNIVERSITY OF VIRGINIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; CRYSTAL DEFECTS; MATHEMATICAL MODELS; METALLOGRAPHIC MICROSTRUCTURE; MONTE CARLO METHODS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PRESSURE; SPUTTER DEPOSITION; TEMPERATURE;

ATOMISTIC GROWTH MODELS; DIRECT SIMULATION MONTE CARLO TRANSPORT MODELS;

COPPER;

EID: 0032591767     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (26)