Process windows and properties of tungsten- and vanadium-oxides deposited by MSIP-PVD-process

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 53-57

  Knotek, O ^a   Lugscheider, E ^a   Barwulf S ^a   Barimani, C ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CONTAMINATION; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MATERIALS TESTING; MECHANICAL PROPERTIES; METALLOGRAPHY; MICROHARDNESS; SCANNING ELECTRON MICROSCOPY; SOLID LUBRICANTS; SPUTTER DEPOSITION; X RAY CRYSTALLOGRAPHY;

MAGNETRON SPUTTER ION PLATING; METAL OXIDE PHASES; OXIDATION STABILITY; PROCESS WINDOWS; SCRATCH TESTING; TUNGSTEN OXIDES; VANADIUM OXIDES;

OXIDES;

EID: 0032591097     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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