Silicon nitride coatings formed using the selective area laser deposition (SALD) technique

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 179-184

  Sun, Lianchao ^a   Shaw, Leon L ^a   Marcus, Harris L ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CERAMIC COATINGS; DEPOSITION; ELECTRIC PROPERTIES; GROWTH (MATERIALS); HEAT TREATMENT; MORPHOLOGY; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SILANES; TEMPERATURE;

SELECTIVE AREA LASER DEPOSITION; TETRAMETHYLSILANES; VOLUME GROWTH RATE;

SILICON NITRIDE;

EID: 0032591076     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)

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