Temperature dependence of wafer backside deposition in single wafer CVD reactor

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 209-214

  Wang, Q ^a   Liu, Dennis D ^a   Yeh, Jim ^a  

^a Mitsubishi Silicon America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FABRICATION; MASS TRANSFER; NUCLEATION; SILICA;

BACKSIDE SILICON NODULE FORMATION; TEMPERATURE DEPENDENCE;

SILICON WAFERS;

EID: 0032591072     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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