Functionally gradient PECVD Ti(C,N) coatings

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 407-411

  Shieh, J ^a   Wang, H L ^a   Tsai, M S ^a   Hon, M H ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; COMPOSITION; GROWTH (MATERIALS); MATHEMATICAL MODELS; METHANE; MONOLAYERS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; STRESS CONCENTRATION; TITANIUM COMPOUNDS;

FUNCTIONALLY GRADIENT DESIGN; HARD COATINGS; REACTION GAS RATIO;

COATINGS;

EID: 0032591041     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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